MODELLING OF THE ELIONIC-INDUCED SPUTTERING (SUBLIMATION) OF MATTER
DOI:
https://doi.org/10.32782/KNTU2618-0340/2021.4.2.1.25Keywords:
laser-induced sublimation, Relaxed Optics, modeling, chain processes, sputtering, elionic technologies, ion implantation, acceleratorsAbstract
The problem of modeling the elionic-induced sputtering (sublimation) of matter is represented. It is customary to call elionic technologies the technologies for processing matter with particle beams (ions, neutrons, electrons and photons). Short review of corresponding experimental data of represented. The ways of search the creation of universal theory for the explanation the proper experimental data are discussed. Comparative analysis of thermodynamical theory, physical-chemical models and photo induced theory of sublimation is described. We show that problem of laser-induced sublimation may be represented as surface sputtering of matter. Therefore the problems of ion-induced and electron induced sputtering of matter are analysed too. From physical-chemical point of point of view the processes of sublimation and sputtering have of the same nature. Main difference between laser-induced and particle-induced sputtering (sublimation) is the nature of interaction charge particles and photons with matter. In both cases we have critical value of fluence the corresponding particles. So, for ion implantation surface sputtering is beginning from fluence 3·1018 cm-3. For electrons this value on 2-3 orders of magnitude is greater. Neutron irradiation has a high penetrating ability and material sputtering processes are typical for nuclear and thermonuclear reactors. For laser radiation, the chain process of saturation of the excitation of the corresponding chemical bonds plays an important role. The methods of radiation physics of status solid, Relaxed Optics and irreversible thermodynamics were chosen for modeling. Ion sputtering occurs when irradiated with large doses of ions. In this case, the coefficient of sputtering of the irradiated material is of great importance. Based on this, a physicochemical model is presented, which allows describing the processes of ion sputtering of one and diatomic materials. To simulate laser-induced sublimation, a cascade model of excitation of the corresponding chemical bonds in the excitation saturation mode was used. A comparative analysis with the thermodynamic theory of sublimation is carried out. It is shown that the thermodynamic energy threshold of sublimation is 0.4 values of the Zeitz energy. Estimated calculations for silicon, germanium and steel are presented.
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